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PRODUCTS > FRONT-END > CVD PECVD Depos.


Thin flim deposition systems by CVD (Chemical Vapor Deposition)
and PECVD (Plasma Enhanced Chemical Vapor Deposition)


Applications : microelectronics, photovoltaic,

optical ...


For production : Any type of CVD - Single wafer, Batch, Cluster.
Any type of deposition : SiO2, Si3N4, doped Si, Amporphous Si, Zn.
Deposition thickness : few thousands of Ang to
few µm.



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Download the data sheet :

+33(0)4 90 40 60 90
+33(0)4 90 40 61 05 (FAX)



ZA la Garrigue du Rameyron
84830 Serignan-Du-Comtat
FRANCE
Lun-Ven : 08h30 - 17h00
microtest@microtest-semi.com

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