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PRODUCTS > FRONT-END > PVD Depos.

Vapor deposition equipment


Standard equipment or manufactured on demand
according to specifications.
Any chamber size.
Thermal evaporation or by electron gun (e-beam).
Any type of metal deposition.
Deposition thickness up to several tens of µm.

Options :
Heated substrate holder,
Choice of ion sources for assited deposition or engraving,
Cleaning of the substrate by DC or RF plasma,
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Download the data sheet Deposit by evaporation:
+33(0)4 90 40 60 90
+33(0)4 90 40 61 05 (FAX)



ZA la Garrigue du Rameyron
84830 Serignan-Du-Comtat
FRANCE
Lun-Ven : 08h30 - 17h00
microtest@microtest-semi.com

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