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R&D Equipements


PVD equipments for application
Concerning substrates : flat substrates, 3D, single wafer, Batch.
Any size chamber.
Vertical deposition (up or down), horizontal or confocal
(Possibility of combuning with evaporation in the same cnclosure).
Any type of deposition : metallic, magnetic, insulator,
decorative, anti-corrosion etc ...
Deposit thickness of few angstroms to few microns.
Options :
Heated or cooled substrate holder,
Rotary substrate holder,
Planetary rotation of substrates,
Airlock,
Co-sputtering (confocal or sequential),
DC or RF supply of the ammeter cathodes.



Download the data sheet:
+33(0)4 90 40 60 90
+33(0)4 90 40 61 05 (FAX)



ZA la Garrigue du Rameyron
84830 Serignan-Du-Comtat
FRANCE
Lun-Ven : 08h30 - 17h00
microtest@microtest-semi.com

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