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DIRECT LASER PHOTOLITHOGRAPHY SYSTEMS




 
LASER LITHOGRAPHY SYSTEM : DILASE 250


The laser lithography system Dilase 250 is a versatile and compact equipment gives access to laser lithography to a wide range of new applications such as
microfluidics, micromechanics or photonics.
 
 
 

HIGH RESOLUTION DIRECT LASER LITHOGRAPHY SYSTEM : DILASE 650

The Hight resolution direct laser lithography
system Dilase 650 is a powerful, offering a maximum of flexibility.
Dilase 650 offers you the possibility to work with one or two writing lasers, to be focused into one to two beam sizes ranging from 1µm to 50 µm.
 
  

 

 
CUSTOMISABLE LASER LITHOGRAPHY SYSTEM : DILASE 750

The customisable laser lithography system Dilase 750 offers you the the possibility to work with one, two or three writing laser sources over one, two or three laser beam widths ranging from 0,5µm to 50µm.
It enables the writing on any type of substrate (photomask, semiconductors, glass, polymers, cristal, flexible films...) over a standard working surface of 6"x6", extendable up to 12"x12" and even larger on demand.
   

+33(0)4 90 40 60 90
+33(0)4 90 40 61 05 (FAX)



ZA la Garrigue du Rameyron
84830 Serignan-Du-Comtat
FRANCE
Lun-Ven : 08h30-17h00
microtest@microtest-semi.com

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